{"id":10696,"date":"2024-11-15T15:09:58","date_gmt":"2024-11-15T14:09:58","guid":{"rendered":"https:\/\/greenict.de\/?p=10696"},"modified":"2025-01-28T10:59:31","modified_gmt":"2025-01-28T09:59:31","slug":"abatement-lab-zur-erfassung-der-treibhausgasemissionen-von-prozessen-in-der-halbleiterherstellung","status":"publish","type":"post","link":"https:\/\/greenict.de\/en\/abatement-lab-zur-erfassung-der-treibhausgasemissionen-von-prozessen-in-der-halbleiterherstellung\/","title":{"rendered":"Abatement Lab for monitoring greenhouse gas emissions from semiconductor manufacturing processes"},"content":{"rendered":"<p class=\"translation-block\"><strong>Accurate monitoring of greenhouse gases is crucial to achieving the goals of mitigating the devastating effects of global warming. The Fraunhofer Institute EMFT has established a fully functional abatement lab to measure the emissions of the PFAS gases, NF<sub>3<\/sub> and SF<sub>6<\/sub> used in the semiconductor processes. At the same time, climate-friendly gas (FAN gas mixture) was used, demonstrating the potential of using gas abatement systems without burners.<\/strong><\/p>\n\n\n\n<div class=\"wp-block-media-text is-stacked-on-mobile\"><figure class=\"wp-block-media-text__media\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"256\" src=\"https:\/\/greenict.de\/wp-content\/uploads\/2024\/11\/Nguyen_Quoc_Hung_EMFT-002.jpg\" alt=\"\" class=\"wp-image-10699 size-full\" srcset=\"https:\/\/greenict.de\/wp-content\/uploads\/2024\/11\/Nguyen_Quoc_Hung_EMFT-002.jpg 320w, https:\/\/greenict.de\/wp-content\/uploads\/2024\/11\/Nguyen_Quoc_Hung_EMFT-002-300x240.jpg 300w, https:\/\/greenict.de\/wp-content\/uploads\/2024\/11\/Nguyen_Quoc_Hung_EMFT-002-15x12.jpg 15w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure><div class=\"wp-block-media-text__content\">\n<p>A contribution from:<\/p>\n\n\n\n<p>Dr. Quoc Hung Nguyen<br>Silicon Technologies and Devices <br> \nGroup Management - Structuring<\/p>\n\n\n\n<p><\/p>\n\n\n\n<p><em><a href=\"https:\/\/www.emft.fraunhofer.de\/en.html\" target=\"_blank\" rel=\"noreferrer noopener\">Fraunhofer Institute for Electronic Microsystems and Solid State Technologies EMFT<\/a><\/em><\/p>\n<\/div><\/div>\n\n\n\n<p><\/p>\n\n\n\n<p class=\"translation-block\">Around 35% of greenhouse gas emissions from semiconductor manufacturing fall into the category of \u201cdirect emissions\u201d (GHG Scope 1 for \u201cgreenhouse gases\u201d). The contribution of process gases used and emitted in production is up to 80 percent. In the semiconductor manufacturing industry, low-molecular fluorinated gases from the group of per- and polyfluorinated alkyl compounds (PFAS, per- and polyfluoroalkyl substances) as well as NF3 and SF6 are preferably used for the deposition and structuring of thin film layers. These gases usually have a high global warming potential, which is why their climate-damaging emissions must be minimized through the use of exhaust gas purification systems (so-called abatement systems, usually consisting of a burner and scrubber). At the Fraunhofer Institute for Electronic Microsystems and Solid-State Technologies - EMFT, a research team has established a fully equipped abatement lab to measure the emission of such greenhouse gases from the plasma etching and cleaning processes with the highest possible accuracy and to reduce the emission of these harmful substances by adjusting the process parameters.<\/p>\n\n\n\n<p class=\"translation-block\">Dedicated exhaust gas measurement data from individual production facilities has shown that there are increasing inconsistencies between bottom-up and top-down methods for quantifying greenhouse gas emissions. Bottom-up estimates, i.e. measurements in factories, are sometimes only half of the global emissions estimated from atmospheric data (top-down method). Therefore, the precise determination of gas emissions at the factory level would help to further reduce the amount of pollutant gas emitted through appropriate measures and thus improve the global modeling of the emissions calculation.\n<br><br>\nWithin the scope of the \u00bbGreen ICT @ FMD\u00ab project, Fraunhofer EMFT has modified a PECVD (plasma enhanced chemical vapor deposition) deposition system to connect a mass spectrometer at the outlet of the process chamber in order to measure the residual gases that are emitted directly after a process. A classic propane-based burner\/scrubber is used to minimize the concentration of climate-damaging exhaust gases that would otherwise be released into the air. A second mass spectrometer and an FTIR spectrometer are installed at the outlet of the burner to quantify these emitted residual gases - Fig. 1.<\/p>\n\n\n\n<figure class=\"wp-block-image size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"560\" height=\"265\" src=\"https:\/\/greenict.de\/wp-content\/uploads\/2024\/11\/grafik.png\" alt=\"\" class=\"wp-image-10697\" srcset=\"https:\/\/greenict.de\/wp-content\/uploads\/2024\/11\/grafik.png 560w, https:\/\/greenict.de\/wp-content\/uploads\/2024\/11\/grafik-300x142.png 300w, https:\/\/greenict.de\/wp-content\/uploads\/2024\/11\/grafik-18x9.png 18w\" sizes=\"auto, (max-width: 560px) 100vw, 560px\" \/><figcaption class=\"wp-element-caption\">Fig. 1: A fully functional abatement test lab, consisting of a 2-chamber PECVD coating system, vacuum pumps with \u201cgreen mode\u201d function, a modern DAS burner\/scrubber system, 2 mass spectrometers (MS), one of which detects harmful gases directly at the outlet of the PECVD chamber and another, in combination with an FTIR system, quantifies the residual gases at the outlet of the burner\/scrubber unit.\u00a9 Fraunhofer EMFT \/ Robert Wieland<\/figcaption><\/figure>\n\n\n\n<p class=\"translation-block\">Different types of process gases are used in the PECVD system: PFAS gases, NF<sub>3<\/sub>, SF<sub>6<\/sub> and FAN (F<sub>2<\/sub>\/Ar\/N2). FAN gas (GWP = 0) has been used at Fraunhofer EMFT for PECVD cleaning processes for years and is considered a strategic gas substitution for plasma cleaning in order to replace previously used gases with a high GWP, e.g. NF<sub>3<\/sub> or PFAS gases.<\/p>\n\n\n\n<p class=\"translation-block\">In a modern, RPS-based-NF3 chamber clean process (RPS = remote plasma source), measurements with the mass spectrometer at the outlet of the PECVD chamber showed a significantly increased NF<sub>3<\/sub> concentration at the end of the cleaning step. This happened after the plasma was immediately switched off, allowing the remaining pure (undecomposed) NF<sub>3<\/sub> in the plasma source to flow into the vacuum pump - Fig. 2. At the outlet of the abatement system, an increase in NF<sub>3<\/sub> concentration could hardly be detected, as the dilution by the burner supply air and the N2 purge gases is so high that an atmospheric mass spectrometer reaches its measurement resolution limit.\nAlthough optimizing the cleaning process can reduce the above-mentioned increase in NF<sub>3<\/sub> concentration, a longer processing time per wafer is required, which results in a lower wafer throughput and ultimately higher processing costs.  Only the use of FAN gas mixtures instead of NF<sub>3<\/sub> will be able to completely eliminate this increased NF<sub>3<\/sub> concentration.<\/p>\n\n\n\n<p><\/p>\n\n\n\n<figure class=\"wp-block-image size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"452\" height=\"254\" src=\"https:\/\/greenict.de\/wp-content\/uploads\/2024\/11\/grafik-1.png\" alt=\"\" class=\"wp-image-10698\" srcset=\"https:\/\/greenict.de\/wp-content\/uploads\/2024\/11\/grafik-1.png 452w, https:\/\/greenict.de\/wp-content\/uploads\/2024\/11\/grafik-1-300x169.png 300w, https:\/\/greenict.de\/wp-content\/uploads\/2024\/11\/grafik-1-18x10.png 18w\" sizes=\"auto, (max-width: 452px) 100vw, 452px\" \/><figcaption class=\"wp-element-caption translation-block\">Fig. 2: Comparison of the measured NF<sub>2<\/sub> intensities at the outlet of the process chamber during chamber cleaning - the use of NF<sub>3<\/sub> leads to a significant increase in concentration at the end of the cleaning step, as undecomposed NF<sub>3<\/sub> has to be pumped out of the volume of the RPS unit. The NF<sub>2<\/sub> signal is most clearly visible in the mass spectrometer, as the NF<sub>3<\/sub> is broken down into NF<sub>2<\/sub> and F by ionization within the measuring device.\u00a9 Fraunhofer EMFT \/ Quoc Hung Nguyen<\/figcaption><\/figure>\n\n\n\n<p>Initial measurement data with a switched-off burner (i.e. only scrubber operation without combustion with fossil propane gas) using FAN gas and the addition of thiosulphate to the scrubbing water showed no detectable HF concentrations in the exhaust gas - another option for future process control in the PECVD area with reduced harmful gas emissions.<\/p>\n\n\n\n<p>Our Abatement Lab for the detection of fluorine-containing emissions from etching and PECVD chambers used in the manufacturing of microelectronic components is now available to interested partners from industry and business.<\/p>\n\n\n\n<p><\/p>","protected":false},"excerpt":{"rendered":"<p>Fraunhofer EMFT &#8211; Genaue \u00dcberwachung der Treibhausgase ist von entscheidender Bedeutung, um die Ziele zur Bek\u00e4mpfung der verheerenden Folgen der globalen Erw\u00e4rmung zu erreichen. Das Fraunhofer-Institut EMFT hat ein voll funktionsf\u00e4higes Abgasreinigungslabor etabliert, um die Emissionen der in den Halbleiterprozessen verwendeten PFAS-Gase, NF3 und SF6 zu erfassen. Gleichzeitig wurde klimafreundliches Gas (FAN-Gasmischung) eingesetzt, was das Potential des Einsatzes von Abgasreinigungssystemen ohne Brenner zeigt.<\/p>","protected":false},"author":2,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[1],"tags":[85,87,28,86,26,89,90,88],"class_list":["post-10696","post","type-post","status-publish","format-standard","hentry","category-allgemein","tag-abgasreinigung","tag-brenner-waescher","tag-fan-gasmischung","tag-gas-abatement","tag-halbleiterfertigung","tag-pfas","tag-plasmaprozesse","tag-treibhausgase-ueberwachung"],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.3 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Abatement Lab zur Erfassung der Treibhausgasemissionen von Prozessen in der Halbleiterherstellung &#8211; Green ICT<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/greenict.de\/en\/abatement-lab-zur-erfassung-der-treibhausgasemissionen-von-prozessen-in-der-halbleiterherstellung\/\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\\\/\\\/schema.org\",\"@graph\":[{\"@type\":\"Article\",\"@id\":\"https:\\\/\\\/greenict.de\\\/abatement-lab-zur-erfassung-der-treibhausgasemissionen-von-prozessen-in-der-halbleiterherstellung\\\/#article\",\"isPartOf\":{\"@id\":\"https:\\\/\\\/greenict.de\\\/abatement-lab-zur-erfassung-der-treibhausgasemissionen-von-prozessen-in-der-halbleiterherstellung\\\/\"},\"author\":{\"name\":\"Christina F\u00f6rster\",\"@id\":\"https:\\\/\\\/greenict.de\\\/#\\\/schema\\\/person\\\/fef21d45d931b4ef484eb04b19df385a\"},\"headline\":\"Abatement Lab zur Erfassung der Treibhausgasemissionen von Prozessen in der Halbleiterherstellung\",\"datePublished\":\"2024-11-15T14:09:58+00:00\",\"dateModified\":\"2025-01-28T09:59:31+00:00\",\"mainEntityOfPage\":{\"@id\":\"https:\\\/\\\/greenict.de\\\/abatement-lab-zur-erfassung-der-treibhausgasemissionen-von-prozessen-in-der-halbleiterherstellung\\\/\"},\"wordCount\":829,\"commentCount\":0,\"publisher\":{\"@id\":\"https:\\\/\\\/greenict.de\\\/#organization\"},\"image\":{\"@id\":\"https:\\\/\\\/greenict.de\\\/abatement-lab-zur-erfassung-der-treibhausgasemissionen-von-prozessen-in-der-halbleiterherstellung\\\/#primaryimage\"},\"thumbnailUrl\":\"https:\\\/\\\/greenict.de\\\/wp-content\\\/uploads\\\/2024\\\/11\\\/Nguyen_Quoc_Hung_EMFT-002.jpg\",\"keywords\":[\"Abgasreinigung\",\"Brenner\\\/W\u00e4scher\",\"FAN-Gasmischung\",\"Gas Abatement\",\"Halbleiterfertigung\",\"PFAS\",\"Plasmaprozesse\",\"Treibhausgase-\u00dcberwachung\"],\"articleSection\":[\"Allgemein\"],\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"CommentAction\",\"name\":\"Comment\",\"target\":[\"https:\\\/\\\/greenict.de\\\/abatement-lab-zur-erfassung-der-treibhausgasemissionen-von-prozessen-in-der-halbleiterherstellung\\\/#respond\"]}]},{\"@type\":\"WebPage\",\"@id\":\"https:\\\/\\\/greenict.de\\\/abatement-lab-zur-erfassung-der-treibhausgasemissionen-von-prozessen-in-der-halbleiterherstellung\\\/\",\"url\":\"https:\\\/\\\/greenict.de\\\/abatement-lab-zur-erfassung-der-treibhausgasemissionen-von-prozessen-in-der-halbleiterherstellung\\\/\",\"name\":\"Abatement Lab zur Erfassung der Treibhausgasemissionen von Prozessen in der Halbleiterherstellung &#8211; 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